Specific Process Knowledge/Thin film deposition/Deposition of Silicon: Difference between revisions
m →Comparison of the methods for deposition of Silicon: edit cluster sputter name |
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| Line 74: | Line 74: | ||
! Layer thickness | ! Layer thickness | ||
|~5 nm to 2 µm, if thicker layers are needed please ask the furnace team. | |~5 nm to 2 µm, if thicker layers are needed please ask the furnace team. | ||
|few nm to ~ | |few nm to ~ 600 nm | ||
|few nm to ~ 300 nm | |few nm to ~ 300 nm | ||
|No defined limits | |No defined limits | ||