Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch: Difference between revisions
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==SiO2 Etch== | ==SiO2 Etch using resist as masking material== | ||
I am in the process of doing some development of a SiO2 etch. So far I have found this fairly good recipe. For now it is the standard SiO2 etch recipes but I might change the "Standard recipe" a a later time if I find a better one. You are welcome to contact me see more result. I will add them to Labadviser at a later time. | I am in the process of doing some development of a SiO2 etch. So far I have found this fairly good recipe. For now it is the standard SiO2 etch recipes but I might change the "Standard recipe" a a later time if I find a better one. You are welcome to contact me see more result. I will add them to Labadviser at a later time. | ||
/Berit Herstrøm bghe@dtu.dk (Nanolab) | /Berit Herstrøm bghe@dtu.dk (Nanolab) | ||
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Image:C06445_02_15.jpg|1.0µ/0.25µ:<br> Etch depth: 893 nm<br> Resist left: 460 nm | Image:C06445_02_15.jpg|1.0µ/0.25µ:<br> Etch depth: 893 nm<br> Resist left: 460 nm | ||
Image:C06445_02_13.jpg|4µ/1µ:<br> Etch depth: 1033 nm<br> Resist left: 473 nm | Image:C06445_02_13.jpg|4µ/1µ:<br> Etch depth: 1033 nm<br> Resist left: 473 nm | ||
</gallery> | |||
==SiO2 Etch using aSi as masking material== | |||
I am now starting up development of SiO2 etch using aSi as masking material. <br> | |||
The samples I use are: | |||
*6" Si afters with oxide (2µm), | |||
*aSi (~300nm), | |||
*Neg. DUV reist (~60nm barc, ~350 nm resist) | |||
*Reticle: Danchip/Triple-D | |||
*Dose 230 J/m2 | |||
First I need to make sure that the resist work for pattering the aSi layer is good. If the resist is not good the final etch will also not be good. | |||
==DUV optimisation== | |||
Dose test with the doses (J/m2): 200, 210, 220, 230, 240, 250, 270, 280 | |||
The aim was to get good line for 400nm pitch/200nm lines | |||
<gallery caption="400nm pitch 200 nm lines" perrow="5" widths="200px" heights="150px"> | |||
Image:dose200_no2_22.jpg |200 J/m2 400nm/268nm | |||
Image:dose210_no2_15.jpg |210 J/m2 400nm/239nm | |||
Image:dose220_no2_13.jpg |220 J/m2 400nm/208nm | |||
Image:dose230_no2_11.jpg |230 J/m2 400nm/209nm | |||
Image:dose240_no2_05.jpg |240 J/m2 400nm/215nm | |||
Image:dose250_no2_11.jpg |250 J/m2 400nm/207nm | |||
Image:dose260_no2_18.jpg |260 J/m2 400nm/188nm | |||
Image:dose270_no2_24.jpg |270 J/m2 400nm/155nm | |||
Image:dose280_no1_15.jpg |280 J/m2 400nm/0nm | |||
</gallery> | |||
<gallery caption="1000nm pitch 500 nm lines" perrow="3" widths="200px" heights="150px"> | |||
Image:dose210_no2_17.jpg |210 J/m2 1000nm/581nm | |||
Image:dose230_no2_12.jpg |230 J/m2 1000nm/517nm | |||
Image:dose240_no2_03.jpg |240 J/m2 1000nm/518nm | |||
Image:dose250_no2_09.jpg |250 J/m2 1000nm/510nm | |||
Image:dose260_no2_15.jpg |260 J/m2 1000nm/493nm | |||
Image:dose270_no2_22.jpg |210 J/m2 1000nm/494nm | |||
</gallery> | </gallery> | ||