Specific Process Knowledge/Lithography: Difference between revisions
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'''<big>[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|UV Resist Overview]] | '''<big>Resist</big>''' | ||
*[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|UV Resist Overview]] | |||
*DUV Resists | |||
*E-beam resists | |||
'''<big>[[Specific Process Knowledge/Lithography/Pretreatment|Pretreatment]]</big>''' | '''<big>[[Specific Process Knowledge/Lithography/Pretreatment|Pretreatment]]</big>''' | ||
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*[[Specific Process Knowledge/Thin film deposition/MVD|Molecular Vapour Deposition]] | *[[Specific Process Knowledge/Thin film deposition/MVD|Molecular Vapour Deposition]] | ||
*[[Specific Process Knowledge/Lithography/NanoImprintLithography#EVG NIL|Imprinter 01]] | *[[Specific Process Knowledge/Lithography/NanoImprintLithography#EVG NIL|Imprinter 01]] | ||
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