Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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# The C<sub>4</sub>F<sub>8</sub> MFC has been disconnected to maintain a carbon-free (carbon containing masks are allowed) chamber. | # The C<sub>4</sub>F<sub>8</sub> MFC has been disconnected to maintain a carbon-free (carbon containing masks are allowed) chamber. | ||
# The RF generator supplying the power to the coil has been disconnected thus allowing only processes driven by the platen generator. | # The RF generator supplying the power to the coil has been disconnected thus allowing only processes driven by the platen generator. | ||
This kind of experiment will not be allowed on other dry etch tools | This kind of experiment will not be allowed on other dry etch tools as it is obvious that this is incompatible with running any of the usual Bosch processes. | ||
If you want to get access to the tool, then talk to professor Henri Jansen and the dry etch group. | |||
Therefore, you should always make sure that whatever process you may want to run on Pegasus 2 is allowed or even possible. The table below should provide this information. If you want to get access to the tool, then talk to professor Henri Jansen and the dry etch group. | |||
== Current setup and rules on Pegasus 2 == | == Current setup and rules on Pegasus 2 == | ||