Specific Process Knowledge/Cleanroom Chemicals

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This page lists the chemicals that are made available in the cleanroom by Nanolab, covered by the cleanroom access hourly rate.

Acids, bases, and etchants

• Ammonia solution 28%
• Ammonium persulphate (Powder)
• BHF (Mixture of Ammonium fluoride, Ammonium bi fluoride, Hydroflouric acid)
• BOE 7:1 without surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid)
• BOE 7:1 with surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid)
• Boric acid
• Chrome ETCH 18 (Mixture of Ceric ammonium nitrate, Perchloric acid, Nitric acid)
• HF 5%
• HF 40%
• Hydrochloric acid 37%
• Hydrogen peroxide 31%
• Nitric acid 69%
• Phosphoric acid 85%
• Potassium hydroxide (Pellets)
• Potassium hydroxide 50%
• Sulfamic acid
• Sulfuric acid 96%

Developers

• AR 600-546 (Amyl acetate)
• AZ 351B (NaOH based with disodium tetraborate buffer)
• AZ 726 MIF (TMAH based with surfactants added for fast and homogeneous substrate wetting)
• mr-Dev 600 (PGMEA)
• ZED-N50 (n-Amylacetate)

Resists

• AR-P 6200.09
• AZ 4562
• AZ 5214E
• AZ MiR 701 (29cps)
• DUV42S-6 (BARC for stepper)
• KRF M230Y 6cp
• KRF M35G 27cp
• SU-8 2005
• SU-8 2035
• SU-8 2075

Solvents

• 2-Propanol "IPA"
• Acetone
• Anisole
• AR 600-71 (Mixture of Dioxolane, PGME)
• A-Thinner (Anisole)
• Ethanol
• MIBK
• PGMEA (available as mr-Dev 600)
• Remover 1165 (NMP)

Other chemicals

• HMDS