Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions

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 {{Template:Peg2configcontent1
 |ItemName= Approved recipes
-|ItemConfiguration= Running long oxygen cleans is not necessary and must be avoided. Neither are shorter cleans between wafers.
+|ItemConfiguration= The 'std' folder holds the list of currently allowed recipes
-|ItemComment= The absence of carbon containing etch gasses ensures that the process chamber is kept clean.
+|ItemComment= Recipes in other folders may no longer be safe to run.
 }}
 |}