Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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|ItemName= Chamber conditioning and cleaning | |ItemName= Chamber conditioning and cleaning | ||
|ItemConfiguration= Running long oxygen cleans is not necessary and must be avoided. | |ItemConfiguration= Running long oxygen cleans is not necessary and must be avoided. | ||
|ItemComment= | |ItemComment= The absence of carbon containing etch gasses ensures that the process chamber is kept clean. | ||
}} | }} | ||