Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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* [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Nanoscale silicon etching with SF6 and O2|Nanoscale silicon etching with SF6 and O2 ]] | * [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Nanoscale silicon etching with SF6 and O2|Nanoscale silicon etching with SF6 and O2 ]] | ||
* [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Black silicon on Demand|Black silicon on Demand]] | * [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Black silicon on Demand|Black silicon on Demand]] | ||
=== Access to Pegasus 2 configuration templates === | |||
'''Pegasus 2 configuration table version 1''' | |||
* '''Table header''': [[Template:Peg2configheader1]] | |||
* '''Table content''':[[Template:Peg2configcontent1]] | |||
Revision as of 14:48, 4 December 2020
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This system is a research tool and not available to the users
If you want to get access to the tool, then talk to professor Henry Jansen
Access to Pegasus 2 configuration templates
Pegasus 2 configuration table version 1
- Table header: Template:Peg2configheader1
- Table content:Template:Peg2configcontent1