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Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
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* Dry etching of barc
* Dry etching of barc
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* Research tool: Currently the machine is running ultra-precise nano etching
* Research tool
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* Dry etching of 6" silicon  
* Dry etching of 6" silicon  
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* ?
* ?
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!style="background:whitesmoke; color:black" align="center" valign="center" rowspan="4"|Process parameter range
!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Process parameter range
|style="background:whitesmoke; color:black"|RF powers
|style="background:whitesmoke; color:black"|RF powers
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* Verity OES
* Verity OES
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!style="background:whitesmoke; color:black" align="center" valign="center" rowspan="4"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Substrates
|style="background:whitesmoke; color:black"|Sizes
|style="background:whitesmoke; color:black"|Sizes
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|style="background:WhiteSmoke; color:black"|
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