Specific Process Knowledge/Etch/OES: Difference between revisions

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 '''Example: The etching of silicon by fluorine:'''<br>
+The table below contains the most important emission lines for some of the species in dry etching.
+{| border="2" cellspacing="1" cellpadding="1"
+| align="center" style="background:#f0f0f0;"|'''Monitored species'''
+| align="center" style="background:#f0f0f0;" width="120px"|'''Wavelength (nm)'''
+|
+| align="center" style="background:#f0f0f0;"|'''Monitored species'''
+| align="center" style="background:#f0f0f0;" width="120px"|'''Wavelength (nm)'''
+|-
+| Al||308.2, 309.3, 396.1
+|rowspan="11"|
+| In||325.6
+|-
+| AlCl||261.4 || N||674.0
+|-
+| As||235.0 ||  N<sub>2</sub>||315.9, 337.1
+|-
+| C<sub>2</sub>||516.5 ||  NO||247.9, 288.5, 289.3, 303.5, 304.3, 319.8, 320.7, 337.7, 338.6
+|-
+| CF<sub>2</sub>||251.9 ||  O||777.2, 844.7
+|-
+| Cl||741.4 ||  OH||281.1, 306.4, 308.9
+|-
+| CN||289.8, 304.2, 387.0 ||  S||469.5
+|-
+| CO||292.5, 302.8, 313.8, 325.3, 482.5, 483.5, 519.8 ||  Si||288.2
+|-
+| F||703.7, 712.8 ||  SiCl||287.1
+|-
+| Ga||417.2 || SiF||440.1, 777.0
+|-
+| H||486.1, 656.5 || ||
+|-
+|}