Specific Process Knowledge/Etch/OES: Difference between revisions
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The light emitted from the plasma is collected through a view port in the process chamber - preferably directly facing the plasma itself above the wafer. A lens is mounted to focus the light onto an optical fiber feeding it to a spectrometer. The Verity spectrograph and SD1024 controller with SpectraView software are installed on the tools in the list above. It has a 200 nm to 800 nm range with a 0.5 nm step enabling the simultaneous monitoring of any number of narrow bandwidths as a function of time. | The light emitted from the plasma is collected through a view port in the process chamber - preferably directly facing the plasma itself above the wafer. A lens is mounted to focus the light onto an optical fiber feeding it to a spectrometer. The Verity spectrograph and SD1024 controller with SpectraView software are installed on the tools in the list above. It has a 200 nm to 800 nm range with a 0.5 nm step enabling the simultaneous monitoring of any number of narrow bandwidths as a function of time. | ||
'''The etching of silicon by fluorine:'''<br> | '''Example: The etching of silicon by fluorine:'''<br> | ||