Specific Process Knowledge/Etch/OES: Difference between revisions
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'''The plasma:'''<br> | '''The plasma:'''<br> | ||
The plasma emits light as the gas constituents are continuously | Inside the process chamber, the RF field will cause electrons to get pulled off the gas atoms to form ions, radicals and free, fast moving electrons. As the electrons bounce into the gas constituents, they latter are pushed into excited states from which they may decay under emission of photons. | ||
These photons typically have an energy in the visible range and hence the plasma emits light at certain wavelengths | |||
The plasma in the process chamber emits light; the RF field | |||
that depends on what molecules are in the | |||
as the gas constituents are continuously pumped into excited rotational | |||
=fdgsdfg= | =fdgsdfg= | ||