Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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When this is said some users still observe residues when using AR 600-546, "'''All resist'''" have recommended to use 3-5s, dip in pure MIBK to remove residues. | When this is said some users still observe residues when using AR 600-546, "'''All resist'''" have recommended to use 3-5s, dip in pure MIBK to remove residues. | ||
AR 600 546 will dissolve different plastic materials, hence never use it on PS compounds. | |||
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== Dosetests == | == Dosetests == | ||