Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-3: Difference between revisions
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==Pegasus 3 - 150mm silicon etching== | ==Pegasus 3 - 150mm silicon etching== | ||
'''The tool is | '''The tool is ready for user training. ''' | ||
[[Image:05x.jpg |frame|left|x300px|The Pegasus 3 cassette station (left), operator station (center) and support computer with Picoscope process monitoring. ]] | [[Image:05x.jpg |frame|left|x300px|The Pegasus 3 cassette station (left), operator station (center) and support computer with Picoscope process monitoring. ]] | ||
The user manual(s) | The user manual(s) is available, technical information and contact information can be found in LabManager: | ||
Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=455| LabManager] | Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=455| LabManager] | ||
Revision as of 15:57, 16 November 2020
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Pegasus 3 - 150mm silicon etching
The tool is ready for user training.
The user manual(s) is available, technical information and contact information can be found in LabManager:
Equipment info in LabManager
Process information
Hardware changes
A few hardware modifications have been made on the Pegasus 3/4 since it was installed in 2019. The changes are listed below.
Other etch processes
More processes, such as for DUV resist, are currently being developed, but they are not quite 'ready for publication' at LabAdviser so please contact Jonas (mailto:jmli@dtu.dk) for more information.
Advanced Processing - Henri Jansen style
- Etch silicon nanostructures
- Etch high aspect ratio silicon microstructures
- Etch 3 dimensional silicon microstructures
- Etch black silicon
- Using OES to monitor etch process
Wafer bonding
To find information on how to bond wafers or chips to a carrier wafer, click here.
Characterisation of etched trenches
Comparing differences in etched trenches requires a set of common parameters for each trench. Click HERE to find more information about the parameters used on the DRIE-Pegasus process development.
Internal Nanolab Process log for Pegasus 3
Process log at Nanolab [1]