Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions

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 !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
-|style="background:WhiteSmoke; color:black" align="center"|[[Specific_Process_Knowledge/Characterization/SEM_LEO|SEM LEO]]
 |style="background:WhiteSmoke; color:black" align="center"|[[Specific_Process_Knowledge/Characterization/SEM_Supra_1|SEM Supra 1]]
 |style="background:WhiteSmoke; color:black" align="center"|[[Specific_Process_Knowledge/Characterization/SEM_Supra_2|SEM Supra 2]]
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 !colspan="2" border="none" style="background:silver; color:black;" align="center"|Model
-|style="background:WhiteSmoke; color:black" align="center"| Leo 1550 SEM
 |style="background:WhiteSmoke; color:black" align="center"| Zeiss Supra 40 VP
 |style="background:WhiteSmoke; color:black" align="center"| Zeiss Supra 60 VP
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 !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Purpose
 |style="background:LightGrey; color:black" align="center" | Imaging and measurement of
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-* Conducting samples
-* Semi-conducting samples
-* Thin (~ 5 µm <) layers of non-conducting materials such as polymers
 |style="background:WhiteSmoke; color:black"|
 * Conducting samples
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 |style="background:LightGrey; color:black" align="center" |Other purpose
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-* E-beam lithography using Raith Elphy Quantum system
 |style="background:WhiteSmoke; color:black"| <!-- comment -->
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 !style="background:silver; color:black;" align="center" width="60"|Instrument location
 |style="background:LightGrey; color:black"|
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-*Cleanroom of DTU Nanolab in building 346
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 *Basement of building 346
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 !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
 |style="background:LightGrey; color:black" rowspan="2" align="center" |Resolution
-|style="background:Whitesmoke; color:black" colspan="5" align="center"| The resolution of a SEM is strongly dependent on the type of sample and the skills of the operator. The highest resolution is probably only achieved on special samples
+|style="background:Whitesmoke; color:black" colspan="4" align="center"| The resolution of a SEM is strongly dependent on the type of sample and the skills of the operator. The highest resolution is probably only achieved on special samples
 |-
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-* ~ 5 nm (limited by vibrations)
 |style="background:WhiteSmoke; color:black"|
 * 1-2 nm (limited by vibrations)
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 !style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics
 |style="background:LightGrey; color:black" align="center" |Detectors
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-* Secondary electron (Se2)
-* Inlens secondary electron (Inlens)
-* Backscatter electron (BSD)
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 * Secondary electron (Se2)
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 |style="background:LightGrey; color:black" align="center" |Stage
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-* X, Y: 125 &times; 100 mm
-* T: 0 to 90<sup>o</sup>
-* R: 360<sup>o</sup>
-* Z: 48 mm
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 * X, Y: 130 &times; 130 mm
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 |style="background:LightGrey; color:black" align="center" |Electron source
-|style="background:Whitesmoke; color:black" colspan="4" align="center"| FEG (Field Emission Gun) source
+|style="background:Whitesmoke; color:black" colspan="3" align="center"| FEG (Field Emission Gun) source
 |style="background:WhiteSmoke; color:black"|
 * Thermionic tungsten filament
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 |style="background:LightGrey; color:black" align="center" |Operating pressures
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-* Fixed at High vacuum (2 &times; 10<sup>-5</sup>mbar - 10<sup>-6</sup>mbar)
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 * Fixed at High vacuum (2 &times; 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
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 |style="background:LightGrey; color:black" align="center" |Options
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-* Raith Elphy Quantum E-Beam Litography system
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 * All software options available
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 !style="background:silver; color:black" align="center" valign="center" rowspan="3" align="center" |Substrates
 |style="background:LightGrey; color:black" align="center" |Sample sizes
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-* Wafers up to 6" (only full view up to 4")
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 * Up to 6" wafer with full view
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 | style="background:LightGrey; color:black" align="center" |Allowed materials
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-* Any standard cleanroom materials
 |style="background:WhiteSmoke; color:black"|
 * Any standard cleanroom material and samples from the 	Laser Micromachining tool and the Polymer Injection Molding tool
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 ==Comparison of SEM's in building 346==