Specific Process Knowledge/Thin film deposition: Difference between revisions
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== Choose deposition equipment == | == Choose deposition equipment == | ||
*Alcatel - ''E-beam evaporator and sputter tool'' | *[[/Alcatel|Alcatel]] - ''E-beam evaporator and sputter tool'' | ||
*Lesker - ''Sputter tool'' | *[[/Lesker|Lesker]] - ''Sputter tool'' | ||
*Leybold - ''E-beam evaporator and multiple wafer tool'' | *[[/Leybold|Leybold]] - ''E-beam evaporator and multiple wafer tool'' | ||
*Wordentec - ''E-beam evaporator, sputter and thermical evaporator'' | *[[/Wordentec|Wordentec]] - ''E-beam evaporator, sputter and thermical evaporator'' | ||
*Hummer - ''Gold sputtering system'' | *[[/Hummer|Hummer]] - ''Gold sputtering system'' | ||
*[[/PECVD|PECVD]] - ''Plasma Enhanced Chemical Vapor deposition'' | *[[/PECVD|PECVD]] - ''Plasma Enhanced Chemical Vapor deposition'' | ||
*[[/B2 Furnace LPCVD Nitride|B2 Furnace LPCVD Nitride]] - ''Deposition of silicon nitrid'' | *[[/B2 Furnace LPCVD Nitride|B2 Furnace LPCVD Nitride]] - ''Deposition of silicon nitrid'' | ||