Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions

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	[[Image:Lesker_roughness_Bjarke.JPG\|1000px\|thumb\|Figure 1:Left: no RF bias (wafer 12) gives high roughness. Right: RF bias (Wafer 21) gives low roughness]]		[[Image:Lesker_roughness_Bjarke.JPG\|1000px\|thumb\|Figure 1:Left: no RF bias (wafer 12) gives high roughness. Right: RF bias (Wafer 21) gives low roughness]]