Specific Process Knowledge/Characterization: Difference between revisions
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== Choose equipment == | == Choose equipment == | ||
===[[SEM: Scanning Electron Microscopy]]=== | ===[[/SEM: Scanning Electron Microscopy|SEM: Scanning Electron Microscopy]]=== | ||
*FEI SEM | *FEI SEM | ||
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*LEO SEM | *LEO SEM | ||
===[[AFM: Atomic Force Microscopy]]=== | ===[[/AFM: Atomic Force Microscopy|AFM: Atomic Force Microscopy]]=== | ||
*Nanoman - ''AFM'' | *Nanoman - ''AFM'' | ||
===[[Profiler]]=== | ===[[/Profiler|Profiler]]=== | ||
*[[Dektak 8 stylus profiler]] | *[[Dektak 8 stylus profiler]] | ||
*Tencor | *Tencor | ||
===[[Optical microscope]]=== | ===[[/Optical microscope|Optical microscope]]=== | ||
===[[Optical characterization]]=== | ===[[/Optical characterization|Optical characterization]]=== | ||
*Ellipsometer | *Ellipsometer | ||
*Filmtek | *Filmtek | ||
*Prism Coupler | *Prism Coupler | ||
===[[SIMS: Secondary Ion Mass Spectrometry]]=== | ===[[/SIMS: Secondary Ion Mass Spectrometry|SIMS: Secondary Ion Mass Spectrometry]]=== | ||
*Atomika SIMS | *Atomika SIMS | ||
===Drop Shape | ===[[/Drop Shape Analyzer|Drop Shape Analyzer]]=== | ||
===4-Point Probe=== | ===[[/4-Point Probe|4-Point Probe]]=== | ||
=== | ===[[/Thickness Measurer|Thickness Measurer]]=== | ||
Revision as of 11:52, 23 October 2007
Choose topic
- Surface imaging
- Topographic measurement
- Stress measurement
- Measurement of optical constants
- Film thickness measurement
- Wafer thickness measurement
- Element analysis
- Hydrophobicity measurement
- Resistivity measurement
- Other electrical measurements
Choose equipment
SEM: Scanning Electron Microscopy
- FEI SEM
- JEOL SEM
- LEO SEM
AFM: Atomic Force Microscopy
- Nanoman - AFM
Profiler
- Dektak 8 stylus profiler
- Tencor
Optical microscope
Optical characterization
- Ellipsometer
- Filmtek
- Prism Coupler
SIMS: Secondary Ion Mass Spectrometry
- Atomika SIMS