Specific Process Knowledge/Wafer cleaning/7-up & Piranha

Cleaning of wafers or masks

7-up 4": positioned in cleanroom 3<br\> -Up to 19 wafers of 4" at a time.<br\> -Materials allowed: Silicon, Silicon oxide, Silicon nitride, PolySi

Cleaning of wafers or masks with sulphuric acid can be done either in a dedicated tank "7-up" or in the fume hood in a beaker "Piranha" Both 7-up and Piranha removes heavy organics. Always use one of these after KOH to remove alkali ions before further processing. 7-up and Piranha are also used as cleaning solutions after stripping resist.

Comparing data for "7-up" and Piranha

	"7-up"	Piranha
General description	Cleaning of wafers or masks using the dedicated tanks. There are one tank for masks and glass wafers and one for 4-6" Si wafers in cleanroom 4 and one tank in cleanroom 3 for 4" Si wafers only.	Cleaning of wafers using a beaker in the fumehood in cleanroom 2. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers.
Chemical solution	98% Sulfuric acid and Ammonium sulfate	98% Sulfuric acid and Hydrogen peroxide 4:1 add H$_{2}$O$_{2}$ to H$_{2}$SO$_{4}$
Process temperature	80 oC	~70 oC the chemicals will heat up to working temperature during mixing, therefore be careful!First ad H2SO4 then H2O2
Process time	10 min.	10 min.
Allowed materials	Dependent on which bath is used, look at the text in the pictures.	All materials (in beaker).
Batch size	1-19/25 4" wafers or 4 masks at a time	1-5 4" wafer at a time
Size of substrate	4-6" wafers	2-4" wafers

7-up 6" in cleanroom 4. <br\> -Up to 25 wafers of 4" or 6" at a time.<br\> -Materials allowed: Silicon, Silicon oxide, Silicon nitride, PolySi

7-up for masks and glass wafers positioned in cleanroom 4:<br\> -Up to 25 glass wafers of 4" at a time or 4 masks.<br\> -Materials allowed: Silicon, Silicon oxide, Silicon nitride, PolySi, glass, chromium