Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
No edit summary |
|||
| Line 4: | Line 4: | ||
[[Category: Etch (Dry) Equipment|DRIE]] | [[Category: Etch (Dry) Equipment|DRIE]] | ||
===This system is a research tool and not available to the users | ===This system is a research tool and not available to the users=== | ||
If you want to get access to the tool, then take to professor Henry Jansen | If you want to get access to the tool, then take to professor Henry Jansen | ||
* [[Specific Process Knowledge/Etch/DRIE-Pegasus/Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>|Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>]] | * [[Specific Process Knowledge/Etch/DRIE-Pegasus/Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>|Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>]] | ||
*[[/Si Nano Etching|Black silicon on Demand]] | *[[/Si Nano Etching|Black silicon on Demand]] | ||
Revision as of 11:23, 11 May 2020
Feedback to this page: click here
This system is a research tool and not available to the users
If you want to get access to the tool, then take to professor Henry Jansen
- [[Specific Process Knowledge/Etch/DRIE-Pegasus/Nanoscale silicon etching with SF6 and O2|Nanoscale silicon etching with SF6 and O2]]
- Black silicon on Demand