Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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*[[/Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>|Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>]] | * [[/Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>|Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>]] | ||
*[[/Si Nano Etching|Black silicon on Demand]] | *[[/Si Nano Etching|Black silicon on Demand]] |
Revision as of 11:21, 11 May 2020
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- [[/Nanoscale silicon etching with SF6 and O2|Nanoscale silicon etching with SF6 and O2]]
- Black silicon on Demand