Specific Process Knowledge/Thin film deposition

3rd Level - Material/Method

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Choose material to deposit

Semiconductors	Oxides	Metals	Nitrides	Alloys	Transparent conductive oxides	Polymers
Silicon Germanium	Aluminium Oxide (Al2O3) Barium titanate (BaTiO3) Chromium Oxide (Cr2O3) Hafnium Oxide (HfO2) Silicon Oxide (SiO2) Titanium Oxide (TiO2) Tantalum Oxide (Ta2O5) Zinc Oxide (ZnO)	Aluminium Chromium Cobalt Copper Gold Iron Magnesium Molybdenum Nickel Niobium Palladium Platinum Ruthenium Silver Tantalum Tin Titanium Tungsten Zinc	Silicon Nitride - and oxynitride Titanium Nitride - conductive ceramics Aluminum Nitride (AlxNy)	AlCu CoFe CuTi FeMn MnIr NbTi NiCo NiFe NiV alloy TiW alloy (10%/90% by weight) And an electroceramic: YSZ (Yttrium stabilized zirconia)	ITO (Tin doped Indium Oxide) AZO (Aluminum doped Zinc Oxide)	SU-8 Antistiction coating Topas PMMA

Choose deposition equipment

PVD	LPCVD	PECVD	ALD	Coaters	Others
Sputter-system Metal-Oxide (PC1) and Sputter-system Metal-Nitride (PC3) - Cluster-based multi-chamber high vacuum sputtering deposition system Lesker - Sputter tool Wordentec - E-beam evaporator, sputter and thermal evaporator Thermal evaporator E Beam Evaporator (Temescal) Physimeca - E-beam evaporator IBE/IBSD Ionfab 300 - Sputter deposition of high quality optical layers and milling/etching Sputter coater 03 - Gold sputtering system Sputter coater 04 - Gold sputtering system	Furnace LPCVD Nitride (4" and 6") - Deposition of silicon nitride Furnace LPCVD Polysilicon (4" and 6") Deposition of polysilicon Furnace LPCVD TEOS (4") - Deposition of silicon oxide	PECVD - Plasma Enhanced Chemical Vapor deposition Black Magic PECVD - Black Magic PECVD (Carbon) Seki Diamond CVD - Microwave Plasma CVD for diamond Growth	ALD1 - Atomic Layer Deposition (thermal) ALD2 (PEALD) - Atomic Layer Deposition (thermal and plasma enhanced)	See the Lithography/Coaters page for coating polymers	MVD - Molecular Vapor Deposition Electroplating-Ni - Electrochemical deposition of nickel Electroplating-Cu - Electrochemical deposition of copper MOCVD - Epitaxial growth - Ask the department of photonics if you are interested: Elizaveta Semenova or Kresten Yvind