Specific Process Knowledge/Thin film deposition/Deposition of ITO: Difference between revisions
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*RF sputtering of an ITO target - reactive sputtering possible | *RF sputtering of an ITO target - reactive sputtering possible |
Revision as of 09:50, 22 April 2020
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Deposition of ITO
ITO (indium tin oxide) can be deposited by sputtering here at Nanolab. An ITO target is used and it may be sputtered either non-reactively in Ar or reactively in a mixture of Ar and O2.
- Deposition conditions and a few results for ITO deposited for the acceptance test of the Sputter-System Metal-Oxide(PC1)
Comparison of the methods for deposition of ITO
Sputter-System(Lesker) | Sputter-System Metal-Oxide(PC1) | |
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Generel description |
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Stoichiometry |
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Film Thickness |
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Deposition rate |
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Step coverage |
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Process Temperature |
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Substrate size |
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Allowed materials |
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