Specific Process Knowledge/Thin film deposition/Deposition of ITO: Difference between revisions
page showing that both new and old Lesker sputterers can be used to deposit ITO |
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==Deposition of ITO== | ==Deposition of ITO== | ||
ITO (indium tin oxide) can be deposited by sputtering here at Nanolab. An ITO target is used and it may be sputtered either | ITO (indium tin oxide) can be deposited by sputtering here at Nanolab. An ITO target is used and it may be sputtered either non-reactively in Ar or reactively in a mixture of Ar and O<sub>2</sub>. | ||
*[[Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system#Standard_recipe_performance|Deposition conditions and a few results]] for ITO deposited for the acceptance test of the Sputter-System Metal-Oxide(PC1) | *[[Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system#Standard_recipe_performance|Deposition conditions and a few results]] for ITO deposited for the acceptance test of the Sputter-System Metal-Oxide(PC1) | ||