Specific Process Knowledge/Thin film deposition/Deposition of Nickel: Difference between revisions
m minor corrections |
m →Nickel deposition: added link w info on deposition rate |
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| Line 58: | Line 58: | ||
|1-10 Å/s | |1-10 Å/s | ||
|Depends on process parameters, about 1 Å/s | |Depends on process parameters, about 1 Å/s | ||
|Depends on process parameters | |Depends on process parameters, at least ~ 4 Å/s, see conditions [[Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system#Standard_recipe_performance|here]] | ||
|~ 10-250 Å/s | |~ 10-250 Å/s | ||