Specific Process Knowledge/Wafer cleaning/Post CMP Cleaner: Difference between revisions

Revision as of 08:33, 21 April 2020

Feedback to this page: click here

Post CMP Cleaner)

The post CMP Cleaner is designed for removing slurry residues from polishing wafers. After the Post CMP cleaner is the recommended cleaning tool after using the Polisher CMP.

The user manual, user APV, technical information and contact information can be found in LabManager:

The Post CMP Cleaner in LabManager

Equipment performance and process related parameters

Equipment		Post CMP Cleaner
Purpose	Cleaning of	Samples from the CMP
Performance	20x20mm substrate	Removal rate: 400nm/min Thickness accuracy: +/- ? µm Thickness homogeneity: +/- ? µm Roughness: +/- ? µm
Performance	100mm substrate	Removal rate: ~ 60 nm/min Thickness accuracy: ? µm Thickness homogeneity: ? µm Roughness: +/- ? µm
Mechanical Cleaning	Brush Cleaning
Power	Megasonic Power from 0-40 W (in water)
Arm sweep	4" and 6" (20x20mm and 2" run with a 4" sweep)
Substrates	Sample size	one 20x20mm piece one 50 mm wafer one 2" wafer one 100 mm wafer one 150 mm wafer
	Allowed materials	Silicon Polysilicon Silicon Oxide Glass/Quartz

@@ Line 22: / Line 22: @@
 !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
-|style="background:WhiteSmoke; color:black"|<b>Polisher/Lapper</b>
+|style="background:WhiteSmoke; color:black"|<b>Post CMP Cleaner</b>
 <!-- |style="background:WhiteSmoke; color:black"|<b>Equipment 2</b> -->
 |-
 !style="background:silver; color:black;" align="center" width="60"|Purpose
 |style="background:LightGrey; color:black"|
-Polishing of
+Cleaning of
 |style="background:WhiteSmoke; color:black"|
-*Silicon
+*Samples from the CMP
-*SiO2
 <!-- |style="background:WhiteSmoke; color:black"|
 *Purpose 1
@@ Line 57: / Line 56: @@
 *Performance range -->
 |-
-!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Process parameter range
+|style="background:LightGrey; color:black"|Mechanical Cleaning
-|style="background:LightGrey; color:black"|Polishing liquid
-|style="background:WhiteSmoke; color:black"|
-*SF1 Polishing Fluid
-|-
-|style="background:LightGrey; color:black"|Polishing cloths
 |style="background:WhiteSmoke; color:black"|
-*Chemcloth Polishing Cloths
+*Brush Cleaning
 |-
-|style="background:LightGrey; color:black"|Rotation
+|style="background:LightGrey; color:black"|Power
 |style="background:WhiteSmoke; color:black"|
-*Plate
+*Megasonic Power from 0-40 W (in water)
-*Head/Puck
 |-
 |style="background:LightGrey; color:black"|Arm sweep
 |style="background:WhiteSmoke; color:black"|
-*Polishing: 20% (inner) - 100% (outer)
+*4" and 6" (20x20mm and 2" run with a 4" sweep)
 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
@@ Line 92: / Line 85: @@
 |style="background:WhiteSmoke; color:black"|
 *Silicon
+*Polysilicon
+*Silicon Oxide
 *Glass/Quartz
 <!-- |style="background:WhiteSmoke; color:black"|