Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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** '''X''' 100±250µm | ** '''X''' 100±250µm | ||
** '''Y''' 200±250µm | ** '''Y''' 200±250µm | ||
Taran Mar 2019, average of 3 4" wafers.< | Taran Mar 2019, average of 3 4" wafers.<br> | ||
The error on the flat alignment is surprising when compared to the 0±0.1° measured on Aligner: Maskless 01. The centring, on the other hand, is seen to be within a few hundred µm, without correcting for the flats. | The error on the flat alignment is surprising when compared to the 0±0.1° measured on Aligner: Maskless 01. The centring, on the other hand, is seen to be within a few hundred µm, without correcting for the flats. | ||