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Specific Process Knowledge/Lithography/UVLithography: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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[[Image:UVLithography.jpg|320x320px|right|frame|]]
[[Image:UVLithography.jpg|320x320px|right|frame|]]


UV Lithography uses ultraviolet light to transfer a pattern from a photo-mask or a design file to a wafer coated with photoresist. The photoresist film is spin coated on the wafers and the pattern is transferred to the wafer by using an aligner. DTU Nanolab houses a number of automatic or manual coaters, mask or maskless aligners, as well as automatic or semi-automatic developers.
UV Lithography uses ultraviolet light to transfer a pattern from a photo-mask or a design file to a wafer coated with photoresist. The photoresist film is spin coated onto the wafers, the design is transferred to the resist by using an aligner, and subsequently the resist pattern is developed. DTU Nanolab houses a number of automatic or manual coaters, mask or maskless aligners, as well as automatic or semi-automatic developers.


= Getting started =
= Getting started =
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