Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
Appearance
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!Scaling [ppm] | !Scaling [ppm] | ||
!Shearing [mRad] | !Shearing [mRad] | ||
! | !Misalignment [µm] | ||
! | !Translation [µm] | ||
!Run-out | !Run-out [ppm] | ||
!Rotation [ppm] | !Rotation [ppm] | ||
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| Line 701: | Line 701: | ||
!Scaling [ppm] | !Scaling [ppm] | ||
!Shearing [mRad] | !Shearing [mRad] | ||
! | !Misalignment [µm] | ||
! | !Translation [µm] | ||
!Run-out | !Run-out [ppm] | ||
!Rotation [ppm] | !Rotation [ppm] | ||
|- | |- | ||