Specific Process Knowledge/Characterization/Topographic measurement: Difference between revisions
→Comparison of the two stylus profilers, the optical profiler and the AFM: Added in the Dektak150 |
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|Only 10x objective: 2.0 mm x 1.7 mm | |Only 10x objective: 2.0 mm x 1.7 mm | ||
|90 µm square | |90 µm square | ||
|Line scan x: 50-55000 µm | |||
|Line scan x: 50-50000 µm | |Line scan x: 50-50000 µm | ||
|- | |- | ||
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|10 mm (piezo range 500 µm) | |10 mm (piezo range 500 µm) | ||
|1 µm (can go up to 5 µm under special settings) | |1 µm (can go up to 5 µm under special settings) | ||
|50 Å to 1 mm | |||
|100 Å to 130 nm | |100 Å to 130 nm | ||
|- | |- | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
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|Resolving power og the lense: 0.92 µm | |Resolving power og the lense: 0.92 µm | ||
|Depending on scan size and number of samples per line and number of lines - accuracy better than 2% | |Depending on scan size and number of samples per line and number of lines - accuracy better than 2% | ||
|down to 0.003 µm | |down to 0.003 µm | ||
|down to 0.5 µm | |||
|- | |- | ||
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|Depending on material and trench width. | |Depending on material and trench width. | ||
|~1:1 with standard cantilever. | |~1:1 with standard cantilever. | ||
|1.2*(W[µm]-5µm) | |||
|1.2*(W[µm]-2.5µm) | |1.2*(W[µm]-2.5µm) | ||
|- | |- | ||
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*White broadband LED: 550nm | *White broadband LED: 550nm | ||
|<12 nm on standard cantilever | |<12 nm on standard cantilever | ||
|5 µm 45<sup>o</sup> cone | |||
|2.5 µm 45<sup>o</sup> cone | |2.5 µm 45<sup>o</sup> cone | ||
|- | |- | ||
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|Can be done on a line or an area | |Can be done on a line or an area | ||
|Can be done on a selected surface area | |Can be done on a selected surface area | ||
|Can be done on a line scan | |||
|Recommended to use Dektak XTA or Dektak 8. | |Recommended to use Dektak XTA or Dektak 8. | ||
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| Line 155: | Line 155: | ||
|100x100 mm | |100x100 mm | ||
|6" or less | |6" or less | ||
|up to 6" | |||
|4" or less | |4" or less | ||
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*Almost any material that does not leave residual on the stage. | *Almost any material that does not leave residual on the stage. | ||
|- | |- | ||
|- | |||
|-style="background:LightGrey; color:black" | |||
!'''Location''' | |||
|Cleanroom F-2 | |||
|Cleanroom F-2 | |||
|Cleanroom F-2 | |||
|Basement, building 346, room | |||
|AFM Icon1: Cleanroom C-1 | |||
AFM Icon2: Basement, building 346, room 904 | |||
|Basement, building 346, room 904 | |||
|Pack-lab, building 347, room 179 | |||
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|} | |} | ||