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Specific Process Knowledge/Characterization/Topographic measurement: Difference between revisions

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!
!
![[Specific Process Knowledge/Characterization/Profiler#Dektak_8_stylus_profiler|Dektak 8 stylus profiler]]
![[Specific Process Knowledge/Characterization/Profiler#Dektak_8_stylus_profiler|Dektak 8 stylus profiler]]
![[Specific Process Knowledge/Characterization/Profiler#Dektak XTA_new_stylus_profiler|Dektak XTA_new stylus profiler]]
![[Specific Process Knowledge/Characterization/Profiler#Dektak XTA_new_stylus_profiler|Dektak XTA stylus profiler]]
![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]]
![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]]
![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Filmetrics)|Optical Profiler (Filmetrics)]]
![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Filmetrics)|Optical Profiler (Filmetrics)]]
![[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|AFM Icon 1 and AFM Icon 2]]
![[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|AFM Icon 1 and AFM Icon 2]]
![[Specific Process Knowledge/Characterization/Profiler#Dektak III-V Profiler|Dektak 3ST]]
![[Specific_Process_Knowledge/Characterization/Profiler#Stylus_Profiler:_Dektak150|Dektak 150 stylus profiler]]
![[Specific Process Knowledge/Characterization/Profiler#Dektak III-V Profiler|Dektak 3ST stylus profiler]]
|-
|-


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|3D Profiler for measuring micro structures and surface roughness. Can do wafer mapping. Positioned in the basement.
|3D Profiler for measuring micro structures and surface roughness. Can do wafer mapping. Positioned in the basement.
|AFM for measuring nanostructures and surface roughness
|AFM for measuring nanostructures and surface roughness
|Profiler for measuring micro structures.
|Profiler for measuring micro structures.
|Profiler for measuring micro structures.
|-
|-
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|90 µm square
|90 µm square
|Line scan x: 50-50000 µm  
|Line scan x: 50-50000 µm  
|Line scan x: 50-55000 µm
|-
|-


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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!'''Max. scan range z'''
!'''Max. scan range z'''
|50Å to 1mm
|50 Å to 1 mm
|50Å to 1mm
|50 Å to 1 mm
|Depending on the objective and Z resolution:
|Depending on the objective and Z resolution:
*94.4 µm ->9984 µm
*94.4 µm ->9984 µm
|10 mm (piezo range 500 µm)
|10 mm (piezo range 500 µm)
|1 µm (can go up to 5 µm under special settings)
|1 µm (can go up to 5 µm under special settings)
|130 nm
|100 Å to 130 nm
|50 Å to 1 mm
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
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|Depending on scan size and number of samples per line and number of lines - accuracy better than 2%
|Depending on scan size and number of samples per line and number of lines - accuracy better than 2%
| 
| 
|down to 0.003 µm
|-
|-


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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!'''Resolution z'''
!'''Resolution z'''
|1Å, 10Å, 40Å or 160Å
|1 Å, 10 Å, 40 Å or 160 Å depending on range
|1Å, 10Å, 80Å or 160Å
|1 Å, 10 Å, 40 Å or 160 Å depending on range
|Depending on measuring methode:
|Depending on measuring methode:
*PSI down to 0.01 nm
*PSI down to 0.01 nm
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*Precision 0.1%
*Precision 0.1%
|<1Å - accuracy better than 2%
|<1Å - accuracy better than 2%
|&nbsp;
|1 Å, 10 Å or 20 Å depending on range
|1 Å, 10 Å, 40 Å or 160 Å depending on range
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!'''Max. scan depth [µm] (as a function of trench width W''')
!'''Max. scan depth [µm] as a function of trench width W''')
|1.2*(W[µm]-5µm)
|1.2*(W[µm]-5µm)
|1.2*(W[µm]-5µm)
|1.2*(W[µm]-5µm)
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|Depending on material and trench width.
|Depending on material and trench width.
|~1:1 with standard cantilever.
|~1:1 with standard cantilever.
|&nbsp;
|1.2*(W[µm]-2.5µm)
|1.2*(W[µm]-5µm)
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!'''Tip radius'''
!'''Standard tip radius'''
|5 µm 45<sup>o</sup> cone
|5 µm 45<sup>o</sup> cone
|5 µm 45<sup>o</sup> cone
|5 µm 45<sup>o</sup> cone
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*White broadband LED: 550nm
*White broadband LED: 550nm
|<12 nm on standard cantilever
|<12 nm on standard cantilever
|&nbsp;
|2.5 µm 45<sup>o</sup> cone
|5 µm 45<sup>o</sup> cone
|-
|-


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|Can be done
|Can be done
|No stress calculation capability
|No stress calculation capability
|Cannot be done
|Cannot be done
|Cannot be done
|Cannot be done
|Cannot be done
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|Can be done on a selected surface area  
|Can be done on a selected surface area  
|Recommended to use Dektak XTA or Dektak 8.
|Recommended to use Dektak XTA or Dektak 8.
|Can be done on a line scan
|-
|-


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|6" or less
|6" or less
|4" or less
|4" or less
|up to 6"
|-
|-


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|
|
*Almost any material that does not leave residual on the stage, please check the responsible group for any non standard materials
*Almost any material that does not leave residual on the stage, please check the responsible group for any non standard materials
|
*Almost any material that does not leave residual on the stage.
|
|
*Almost any material that does not leave residual on the stage.
*Almost any material that does not leave residual on the stage.
|-
|-
|}
|}
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