Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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'''This section is under construction [[Image:section under construction.jpg|70px]]''' | '''This section is under construction [[Image:section under construction.jpg|70px]]''' | ||
'''Important information regarding alignment:''' | |||
After alignment to the specified alignment marks, the Aligner: Maskless 02 will automatically compensate for the translation (shift) and rotation detected during the alignment. The translation is calculated relative to the first alignment mark | |||
'''Alignment accuracy:''' | |||
The alignment accuracy of the Aligner: Maskless 02 is a combination of the position accuracy of the stage, the accuracy of the alignment mark detection, the accuracy of the pattern already on the wafer (first print), and the calibration of the machine (correction of offset between the exposure light axis and the center of the cameras). | The alignment accuracy of the Aligner: Maskless 02 is a combination of the position accuracy of the stage, the accuracy of the alignment mark detection, the accuracy of the pattern already on the wafer (first print), and the calibration of the machine (correction of offset between the exposure light axis and the center of the cameras). | ||