Specific Process Knowledge/Characterization/XPS: Difference between revisions

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|style="background:LightGrey; color:black"|Charge compensation  
|style="background:LightGrey; color:black"|Charge compensation  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"| Flood gun to be used for charge compensation of non conductive samples only
Flood gun can be used for charge compensation of non conductive samples
|style="background:WhiteSmoke; color:black"| Flood gun to be used for charge compensation of non conductive samples and for source of low energy electrons (REELS)
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|style="background:LightGrey; color:black"|Finding structures
|style="background:WhiteSmoke; color:black"|Choose measuring spot from camera image (magnified)
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!rowspan="2" style="background:silver; color:black" align="left"|Depth profiling
|style="background:LightGrey; color:black"|Purpose
|style="background:WhiteSmoke; color:black"|With ion beam etch the top layer of the material can be removed, to do a depth profiling
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|style="background:LightGrey; color:black"|Ion beam size
|style="background:LightGrey; color:black"|Depth profiles
|style="background:WhiteSmoke; color:black"| About 3x1 mm
|style="background:WhiteSmoke; color:black"|Depth profiles with single Ar ion bombardment
 
* Monoatomic energy range 200-3 keV
|style="background:WhiteSmoke; color:black"|Depth profiles with MonoAtomic and Gas Cluster Ion Source (MAGCIS)
* Monoatomic energy range 200-4 keV
* Cluster mode energy range: 2-8 keV
*Cluster size range: 75-2000 atoms
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!rowspan="2" style="background:silver; color:black" align="left"|Substrates
!rowspan="2" style="background:silver; color:black" align="left"|Substrates / Samples
|style="background:LightGrey; color:black"|Substrate size
|style="background:LightGrey; color:black"|Sample holder size: 6x6 cm
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Maximum 60x60 mm
Maximum 60x60 mm
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| style="background:LightGrey; color:black"|Substrate thickness
| style="background:LightGrey; color:black"|Substrate  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Maximum height about 20 mm
Maximum height about 20 mm
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Revision as of 14:43, 6 April 2020

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The XPS tools at DTU Nanolab

The K-Alpha from 2007 is one of the first instruments of this type that was produced.
The Nexsa from 2019 is on the surface very similar to the K-Alpha. It's panels, however, hide a whole range of supplementary techniques.


In the basement under the cleanroom two X-ray Photoelectron Spectroscopy (XPS) systems are installed back-to-back in the center of room 904. They are both manufactured by Thermofisher and they enable the users to perform elemental and chemical analysis of samples. The XPS K-Alpha is a base technique instrument providing XPS analysis. The XPS Nexsa is an upgraded version with all options.

Elemental analysis

The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page Element analysis.

More about the different possibilities of the XPS instrument is found here:

Getting access to the XPS tools

Click HERE to see information on how to get access to the XPS.

Analyzing XPS spectra

The analysis of XPS spectra is an art in itself. Click on the link below to find a some examples in which the Avantage software package has been used to extract information from experiments.

Techniques and option on the XPS tools

Equipment K-Alpha Nexsa
Purpose Main XPS analysis using monochromated Al-Kα radiation at 1486.6 eV XPS analysis using monochromated Al-Kα radiation at 1486.6 eV
Alternative/complementary
  • Workfunction measurements
  • Ultraviolet Photoelectron Spectroscopy (UPS) with He I and He II UV source
  • Ion Scattering Spectroscopy (ISS)
  • Reflected Electron Energy Loss Spectroscopy
  • Angular Resolved Ultraviolet Photoelectron Spectroscopy (ARUPS)
Performance Spot size XPS: 30µm - 400µm
  • XPS: 10µm - 400µm
  • Raman: > 15 µm
Pass energy 10-400 eV 10-400 eV (XPS and ISS)
Analysis modes Scanned and snapshot Scanned, snapshot and SnapMap
Charge compensation Flood gun to be used for charge compensation of non conductive samples only Flood gun to be used for charge compensation of non conductive samples and for source of low energy electrons (REELS)
Depth profiles Depth profiles with single Ar ion bombardment
  • Monoatomic energy range 200-3 keV
 Depth profiles with MonoAtomic and Gas Cluster Ion Source (MAGCIS)
  • Monoatomic energy range 200-4 keV
  • Cluster mode energy range: 2-8 keV
  • Cluster size range: 75-2000 atoms
Substrates / Samples Sample holder size: 6x6 cm

Maximum 60x60 mm

Substrate

Maximum height about 20 mm

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