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Specific Process Knowledge/Characterization/XPS: Difference between revisions

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|style="background:LightGrey; color:black"|Charge compensation  
|style="background:LightGrey; color:black"|Charge compensation  
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|style="background:WhiteSmoke; color:black"| Flood gun to be used for charge compensation of non conductive samples only
Flood gun can be used for charge compensation of non conductive samples
|style="background:WhiteSmoke; color:black"| Flood gun to be used for charge compensation of non conductive samples and for source of low energy electrons (REELS)
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|style="background:LightGrey; color:black"|Finding structures
|style="background:WhiteSmoke; color:black"|Choose measuring spot from camera image (magnified)
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!rowspan="2" style="background:silver; color:black" align="left"|Depth profiling
|style="background:LightGrey; color:black"|Purpose
|style="background:WhiteSmoke; color:black"|With ion beam etch the top layer of the material can be removed, to do a depth profiling
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|style="background:LightGrey; color:black"|Ion beam size
|style="background:LightGrey; color:black"|Depth profiles
|style="background:WhiteSmoke; color:black"| About 3x1 mm
|style="background:WhiteSmoke; color:black"|Depth profiles with single Ar ion bombardment
 
* Monoatomic energy range 200-3 keV
|style="background:WhiteSmoke; color:black"|Depth profiles with MonoAtomic and Gas Cluster Ion Source (MAGCIS)
* Monoatomic energy range 200-4 keV
* Cluster mode energy range: 2-8 keV
*Cluster size range: 75-2000 atoms
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!rowspan="2" style="background:silver; color:black" align="left"|Substrates
!rowspan="2" style="background:silver; color:black" align="left"|Substrates / Samples
|style="background:LightGrey; color:black"|Substrate size
|style="background:LightGrey; color:black"|Sample holder size: 6x6 cm
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Maximum 60x60 mm
Maximum 60x60 mm
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| style="background:LightGrey; color:black"|Substrate thickness
| style="background:LightGrey; color:black"|Substrate  
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Maximum height about 20 mm
Maximum height about 20 mm
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