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Specific Process Knowledge/Thin film deposition: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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[[/Deposition of Silicon Oxide|Silicon Oxide]]<br/>
[[/Deposition of Silicon Oxide|Silicon Oxide (SiO<sub>2</sub>)]]<br/>
[[/Deposition of Titanium Oxide|Titania (TiO<sub>2</sub>, Titanium Oxide)]]<br/>
[[/Deposition of Titanium Oxide|Titanium Oxide (TiO<sub>2</sub>)]]<br/>
[[/Deposition of Alumina|Alumina (Al<sub>2</sub>O<sub>3</sub>, Aluminium Oxide)]]<br/>
[[/Deposition of Alumina|Aluminium Oxide (Al<sub>2</sub>O<sub>3</sub>)]]<br/>
[[/Lesker|Tantalum (Ta<sub>2</sub>O<sub>5</sub>, Tantalum pentoxide)]]<br/>
[[/Lesker|Tantalum Oxide (Ta<sub>2</sub>O<sub>5</sub>)]]<br/>
[[/Lesker|Chromia (Cr<sub>2</sub>O<sub>3</sub>, Chromium Oxide)]]<br/>
[[/Lesker|Chromium Oxide (Cr<sub>2</sub>O<sub>3</sub>)]]<br/>
[[/Deposition of Hafnium Oxide|Hafnium Oxide]]<br/>
[[/Deposition of Hafnium Oxide|Hafnium Oxide (HfO<sub>2</sub>)]]<br/>


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[[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/>
[[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/>
[[/Deposition of Titanium Nitride|Titanium Nitride]] - ''ceramic'' <br/>
[[/Deposition of Titanium Nitride|Titanium Nitride]] - ''conductive ceramics'' <br/>
[[/Deposition of Aluminium Nitride| Aluminum Nitride (Al<sub>x</sub>N<sub>y</sub>)]]<br/>
[[/Deposition of Aluminium Nitride| Aluminum Nitride (Al<sub>x</sub>N<sub>y</sub>)]]<br/>


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