Specific Process Knowledge/Characterization/Optical microscope: Difference between revisions
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!Noco IR[[image: | !Noco IR[[image:Noco IR microscope.jpg|100x100px|thumb|center]][[image:Noco IR microscope_1.jpg|100x100px|thumb|center]] | ||
|346-901 | |346-901 | ||
|Wet chemistry | |Wet chemistry | ||
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|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:center;" | |-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:center;" | ||
!Nikon Eclipse L200 #2[[image:Nikon | !Nikon Eclipse L200 #2[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|center]] | ||
|C1 | |C1 | ||
|Thin Film | |Thin Film | ||
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|-style="background:LightGrey; color:black; vertical-align:middle; text-align:center;" | |-style="background:LightGrey; color:black; vertical-align:middle; text-align:center;" | ||
!Zeiss Jenatech[[image: | !Zeiss Jenatech[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]] | ||
|C1 | |C1 | ||
|Thin Film | |Thin Film | ||
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!Nikon Eclipse L200 #1[[image:Nikon | !Nikon Eclipse L200 #1[[image:Nikon Eclipse L200.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|center]] | ||
|D3 | |D3 | ||
|Thin Film | |Thin Film | ||
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!Leitz Medilux[[image: | !Leitz Medilux[[image:Leitz Medilux.jpg|100x100px|thumb|center]] | ||
|D3 | |D3 | ||
|Thin Film | |Thin Film | ||
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!Nikon Eclipse L200N #3[[image:Nikon | !Nikon Eclipse L200N #3[[image:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|center]] | ||
|E4 | |E4 | ||
|Lithography | |Lithography | ||
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!Nikon Eclipse L200N #4[[image:Nikon | !Nikon Eclipse L200N #4[[image:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|center]] | ||
|E5 | |E5 | ||
|Lithography | |Lithography | ||
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!Nikon ME 600[[image:Nikon | !Nikon ME 600[[image:Nikon ME 600.jpg|100x100px|thumb|center]][[image:Nikon ME 600_1.jpg|100x100px|thumb|center]] | ||
|F1 | |F1 | ||
|Thin Film | |Thin Film | ||
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!Leica S8 APO[[image: | !Leica S8 APO[[image:Leica S8 APO.jpg|100x100px|thumb|center]] | ||
|F2 | |F2 | ||
|Thin Film | |Thin Film | ||
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!Zeiss Axiotron[[image: | !Zeiss Axiotron[[image:Zeiss Axiotron.jpg|100x100px|thumb|center]][[image:Zeiss Axiotron_1.jpg|100x100px|thumb|center]] | ||
|F3 | |F3 | ||
|Lithography | |Lithography |
Revision as of 14:03, 3 April 2020
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Zeiss Jenatech (strain) | Nikon SMZ 1500 | Leica S8 APO | Leitz Medilux | Zeiss Axiotron 2 | Zeiss Jenatech (particles measurements) | Noco IR microscope | Nikon SMZ 1000 | Nikon ME 600 | Nikon Eclipse L200 | Nikon Eclipse L200 (2) | Nikon ECLIPSE L200N 3 | Nikon ECLIPSE L200N 4 | |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Location | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager | Check LabManager |
Special features | Wollastron prism | Stereoscopic microscope | Stereoscopic microscope | No | No | No | Infra red (IR) camera | Stereoscopic microscope | Wollastron prism | Motorized stage | No | No | No |
Ocular magnification | 10x | No | No | 10x | 10x | 10x | 10x | No | 10x | 10x | 10x | 10x | 10x |
Objective magnification | 2.5x, 5x, 10x, 20x, 50x | Zoom 100x | Zoom 80x | 2.5x, 5x, 10x, 20x, 50x | 5x, 10x, 20x, 50x | 5x, 10x, 20x, 50x, 100x | 2.5x, 5x, 20x, 50x | Zoom 100x | 5x, 10x, 20x, 50x, 100x | 2.5x, 5x, 10x, 20x, 50x, 100x | 2.5x, 5x, 10x, 20x, 50x, 100x | 2.5x, 5x, 10x, 20x, 50x, 100x | 2.5x, 5x, 10x, 20x, 50x, 100x |
Bright field | Yes | No | No | Yes | Yes | Yes | Yes | No | Yes | Yes | Yes | Yes | Yes |
Dark field | Yes | No | No | No | Yes | Yes | No | No | Yes | Yes | Yes | Yes | Yes |
Polarizer | Yes | No | No | No | No | Yes | No | No | Yes | No | No | No | No |
Episcopic light (reflected light) | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes |
Diascopic light (transmitted light) | No | Yes | No | Yes | Yes | No | Yes | No | No | Yes | Yes | Yes | Yes |
View with eye | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes |
View on screen (camera) | Yes | No | No | Yes | Yes | No | Yes (IR) | No | Yes | Yes | Yes | Yes | Yes |
Measurement option | No | No | No | No | Yes | No | No | No | No | Yes | Yes | Yes | Yes |
It is possible to make an automated scanning of a full wafer on the Nikon Eclipse L200 with motorized stage Nikon Eclipse L200 auto scan guide
THIS PAGE IS UNDER CONSTRUCTION
Microscope | Location | Responsible Group | Objectives | Ocular | Special features | Features | Camera | Analysis software |
---|---|---|---|---|---|---|---|---|
Nikon SMZ 1000 | 346-901 | Wet chemistry | Zoom 0.8x - 8x | 10x | Stereoscopic microscope | Episcopic | No | No |
Noco IR | 346-901 | Wet chemistry |
|
10x | IR imaging |
|
IR camera | No |
Leica INM100 | 346-901 | Wet chemistry |
|
10x |
|
DS-Fi2 | NIS-D | |
Nikon Eclipse L200 #2 | C1 | Thin Film |
|
10x |
|
DS-Fi1 | NIS-D | |
Zeiss Jenatech | C1 | Thin Film |
|
10x |
|
No | No | |
Nikon Eclipse L200 #1 | D3 | Thin Film |
|
10x | Motorized stage |
|
DS-Fi1 | NIS-BR |
Leitz Medilux | D3 | Thin Film |
|
10x |
|
DX40-274FW | Kappa Control Center | |
Nikon Eclipse L200N #3 | E4 | Lithography |
|
10x |
|
|
NIS-D | |
Nikon Eclipse L200N #4 | E5 | Lithography |
|
10x |
|
|
NIS-D | |
Nikon ME 600 | F1 | Thin Film |
|
10x |
|
DS-Fi2 | NIS-D | |
Leica S8 APO | F2 | Thin Film | Zoom 1x - 8x | 10x | Stereoscopic microscope | Episcopic | No | No |
Zeiss Axiotron | F3 | Lithography |
|
10x |
|
Infinity X | DeltaPix |