Specific Process Knowledge/Characterization/Optical microscope: Difference between revisions
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!Noco IR[[image: | !Noco IR[[image:Noco IR microscope.jpg|100x100px|thumb|center]][[image:Noco IR microscope_1.jpg|100x100px|thumb|center]] | ||
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|Wet chemistry | |Wet chemistry | ||
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!Nikon Eclipse L200 #2[[image:Nikon | !Nikon Eclipse L200 #2[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|center]] | ||
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!Zeiss Jenatech[[image: | !Zeiss Jenatech[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]] | ||
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!Nikon Eclipse L200 #1[[image:Nikon | !Nikon Eclipse L200 #1[[image:Nikon Eclipse L200.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|center]] | ||
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!Leitz Medilux[[image: | !Leitz Medilux[[image:Leitz Medilux.jpg|100x100px|thumb|center]] | ||
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!Nikon Eclipse L200N #3[[image:Nikon | !Nikon Eclipse L200N #3[[image:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|center]] | ||
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!Nikon Eclipse L200N #4[[image:Nikon | !Nikon Eclipse L200N #4[[image:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|center]] | ||
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!Nikon ME 600[[image:Nikon | !Nikon ME 600[[image:Nikon ME 600.jpg|100x100px|thumb|center]][[image:Nikon ME 600_1.jpg|100x100px|thumb|center]] | ||
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!Leica S8 APO[[image: | !Leica S8 APO[[image:Leica S8 APO.jpg|100x100px|thumb|center]] | ||
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!Zeiss Axiotron[[image: | !Zeiss Axiotron[[image:Zeiss Axiotron.jpg|100x100px|thumb|center]][[image:Zeiss Axiotron_1.jpg|100x100px|thumb|center]] | ||
|F3 | |F3 | ||
|Lithography | |Lithography |
Revision as of 15:03, 3 April 2020
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It is possible to make an automated scanning of a full wafer on the Nikon Eclipse L200 with motorized stage Nikon Eclipse L200 auto scan guide
THIS PAGE IS UNDER CONSTRUCTION