Specific Process Knowledge/Characterization/XRD: Difference between revisions
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*The [[/XRD_Powder|XRD Powder] for phase analysis of powders | *The [[/XRD_Powder|XRD Powder] for phase analysis of powders | ||
=Data analysis= | |||
=Comparison of the XRDs at Nanolab= | |||
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Revision as of 13:15, 3 April 2020
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XRD at Nanolab
We have two X-ray diffraction setups in building 346:
- The Rigaku SmartLab primarily for thin film analysis
- The [[Specific Process Knowledge/Characterization/XRD/XRD_Powder|XRD Powder] for phase analysis of powders
Data analysis
Comparison of the XRDs at Nanolab
Equipment | XRD SmartLab | XRD Powder | |
---|---|---|---|
Purpose | Crystal structure analysis and thin film thickness measurement |
|
|
X-ray generator |
Maximum rated output |
3 kW |
600 W |
Rated tube voltage |
20 to 45 kV |
40 kV | |
Rated tube current |
2 to 60 mA |
15 mA | |
Type |
Sealed tube |
Sealed tube | |
Target |
Cu |
Cu | |
Focus size |
0.4 mm x 8 mm (Line/Point) |
0.4 mm x 12 mm (Line) | |
Goniometer |
Scanning mode |
incident / receiver coupled or independent |
incident / receiver coupled |
Goniomenter radius |
300 mm |
145 mm | |
Minimum step size |
0.0001° (0.36") |
0.001° (3.6") | |
Sample stage |
|
Fixed with rotation | |
Sample size |
Diameter: 150 mm Thickness: 0~21 mm |
Powders | |
Optics | Incident side |
|
|
Receiver side |
|
| |
Substrates | Measurement temperature |
Room temperature |
May be heated in N2 up to 500°C |
Substrate size |
up to 150 mm wafers |
Only for powders | |
Allowed materials |
All materials |
All materials have to be approved |