Specific Process Knowledge/Etch/DRIE-Pegasus/System-description: Difference between revisions
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This section applies to Pegasus 1. | This section applies to Pegasus 1. | ||
The plasma of any dry etch process emits light as the gas constituents ( gas molecules, ions and radicals) deexcite from high energy states. Every gas molecule, ions etc. have unique vibrational and rotational energy states. | |||