Jump to content

Specific Process Knowledge/Thin film deposition: Difference between revisions

← Older editNewer edit →
VisualWikitext
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,736 edits
Line 56: Line 56:
[[/Lesker|MnIr]]<br/>
[[/Lesker|MnIr]]<br/>
[[/Lesker|NiCo]]<br/>
[[/Lesker|NiCo]]<br/>
[[/Deposition of NiFe|NiFe (e.g., Invar)]]<br/>
[[/Deposition of NiFe|NiFe (e.g., Permalloy, Invar)]]<br/>
[[/Lesker|YSZ (Yttrium stabilized Zirconium)]]<br/>
[[/Lesker|YSZ (Yttrium stabilized Zirconium)]]<br/>
|style="background: LightGray"|
|style="background: LightGray"|
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition"