Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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[[Image:Coolplate2.jpg|250px|right|]] | [[Image:Coolplate2.jpg|250px|right|]] | ||
We do have the possibility of making cold development, to get more vertical and smoother sidewalls. We have a coolplate that can go down to - | We do have the possibility of making cold development, to get more vertical and smoother sidewalls. We have a coolplate that can go down to -2°C, with a ramp of app. 3 °C/min. | ||
Is it recommended to make a dose test, if one is to transfer from ordinary development to cold. | Is it recommended to make a dose test, if one is to transfer from ordinary development to cold. | ||