Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions
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## [[Specific_Process_Knowledge/Etch/DRIE-Pegasus/System-description#Why_RF_matching_is_extremely_important_in_the_Bosch_process | Why RF matching is extremely important in the Bosch process ]] | ## [[Specific_Process_Knowledge/Etch/DRIE-Pegasus/System-description#Why_RF_matching_is_extremely_important_in_the_Bosch_process | Why RF matching is extremely important in the Bosch process ]] | ||
# [[Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope|Picoscope process monitoring]] | # [[Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope|Picoscope process monitoring]] | ||
As of 2017, completing the [[LabAdviser/Courses/TPT_Dry_Etch| Dry Etch TPT course]] is mandatory for all new users. | As of 2017, completing the [[LabAdviser/Courses/TPT_Dry_Etch| Dry Etch TPT course]] is mandatory for all new users. On the TPT web page you will find a version of the latest lecture slides - here you will find information as well. | ||
On the TPT web page you will find a version of the latest lecture slides - here you will find information as well. | |||
== Links to the individual pages for the Pegasi == | == Links to the individual pages for the Pegasi == | ||