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=Deposition of NiFe alloy=
=Deposition of NiFe alloy=
NiFe has been deposited in the [[Specific_Process_Knowledge/Thin_film_deposition/Lesker|Sputter System (Lesker)]] here at Nanolab. Below you will find some results of varying the deposition parameters in that particular setup. You can find more information on the process parameters used by others in the [http://labmanager.dtu.dk/function.php?module=Processlog&view=editlog&machid=244 Process Log] in LabManager.
NiFe has been deposited in the [[Specific_Process_Knowledge/Thin_film_deposition/Lesker|Sputter System (Lesker)]] here at Nanolab.  
You will find information on the pressure, max power and expected deposition rate  [http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Lesker#List_of_available_targets_for_the_Sputter-System.28Lesker.29_.2803_June_2013.29 here] in LabAdviser.  
To see all the deposition parameters used in that machine by others, search the [http://labmanager.dtu.dk/function.php?module=Processlog&view=editlog&machid=244 Process Log] in LabManager.
 
Below you will find some results on optimizing the film crystalline quality for NiFe by Bjarke Thomas Dalslet. Bjarke also investigated the surface roughness of NiFe as a function of change in the substrate bias, but found little variation.  


==Film quality optimization==
==Film quality optimization==
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