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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using Lesker sputter tool: Difference between revisions

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| align="center" style="background:#f0f0f0;"|'''Power(W)'''
| align="center" style="background:#f0f0f0;"|'''Power(W)'''
| align="center" style="background:#f0f0f0;"|'''R<sub>q</sub> (RMS) (nm)'''
| align="center" style="background:#f0f0f0;"|'''R<sub>q</sub> (RMS) (nm)'''
| align="center" style="background:#f0f0f0;"|'''Thickness'''
| align="center" style="background:#f0f0f0;"|'''Thickness (nm)'''
|-
|-
| 3||0||0||157||0.902||
| 3||0||0||157||0.902||
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<br>
<br>
==Oxide insulation analysis==
==Oxide insulation analysis==
''by Bjarke Thomas Dalslet @Nanotech.dtu.dk''
''by Bjarke Thomas Dalslet @Nanotech.dtu.dk''
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