Specific Process Knowledge/Characterization/XRD/XRD SmartLab: Difference between revisions

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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b>
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b>
|style="background:WhiteSmoke; color:black"|<b>XRD Powder</b>
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Purpose  
!style="background:silver; color:black;" align="center" width="60"|Purpose  
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*Roughness
*Roughness
*Density
*Density
|style="background:WhiteSmoke; color:black"|
 
*Phase ID
*Crystal Size
*Crystallinity
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="6"|X-ray generator
!style="background:silver; color:black" align="center" valign="center" rowspan="6"|X-ray generator
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
3 kW
3 kW
|style="background:WhiteSmoke; color:black"|
600 W
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
20 to 45 kV
20 to 45 kV
|style="background:WhiteSmoke; color:black"|
40 kV
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
2 to 60 mA
2 to 60 mA
|style="background:WhiteSmoke; color:black"|
15 mA
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Type
Type
|style="background:WhiteSmoke; color:black"|
Sealed tube
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Sealed tube
Sealed tube
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|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Target
Target
|style="background:WhiteSmoke; color:black"|
Cu
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Cu
Cu
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
0.4 mm x 8 mm (Line/Point)
0.4 mm x 8 mm (Line/Point)
|style="background:WhiteSmoke; color:black"|
0.4 mm x 12 mm (Line)
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Goniometer
!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Goniometer
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
incident / receiver coupled or independent
incident / receiver coupled or independent
|style="background:WhiteSmoke; color:black"|
incident / receiver coupled
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
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|style="background:WhiteSmoke; color:black"|
300 mm
300 mm
|style="background:WhiteSmoke; color:black"|
145 mm
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
0.0001° (0.36")
0.0001° (0.36")
|style="background:WhiteSmoke; color:black"|
0.001° (3.6")
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
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*X,Y:&plusmn;50 mm for a 100 mm wafer
*X,Y:&plusmn;50 mm for a 100 mm wafer
*Rx,Ry:-5~+5°
*Rx,Ry:-5~+5°
|style="background:WhiteSmoke; color:black"|
Fixed with rotation
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
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Diameter: 150 mm  
Diameter: 150 mm  
Thickness: 0~21 mm
Thickness: 0~21 mm
|style="background:WhiteSmoke; color:black"|
Powders
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Optics
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Optics
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*Soller slit
*Soller slit
*Variable divergence slit
*Variable divergence slit
|style="background:WhiteSmoke; color:black"|
*0.04° soller slit
*Ni and Cu filter
*Divergence slits
*Beam mask
|-
|-
|style="background:LightGrey; color:black"|Receiver side
|style="background:LightGrey; color:black"|Receiver side
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*Parallel slit analysers (PSA)
*Parallel slit analysers (PSA)
*Ge(220)x2 analyser
*Ge(220)x2 analyser
|style="background:WhiteSmoke; color:black"|
*0.04° soller slit
*Ni filter
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
up to 150 mm wafers
up to 150 mm wafers
|style="background:WhiteSmoke; color:black"|
Only for powders
|-
|-
| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
All materials
All materials
|style="background:WhiteSmoke; color:black"|
All materials have to be approved
|-  
|-  
|}
|}


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Revision as of 16:12, 23 March 2020

XRD SmartLab

The Rigaku SmartLab is an advanced XRD for measuring on thin films. All thin films can be measured without fixating the sample, as the system has a so called In-Plane arm.

The XRD SmartLab located in cleanroom F-2


The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:

XRD SmartLab in LabManager


Various measurement types including X-Ray reflectivity, Rocking curve, Theta-2theta, and Pole figures are described here:

Process information

Software for analysis

The software packages used for data analysis are available on the equipment computer, but we recommend that you install it on your personal computer. To run the software you need a USB dongle with a license on, these can be borrowed from the equipment responsible (in 2020, these were Kristian, Evgeniy, and Rebecca). We only have 9 dongles available, so when you are done please return the dongle to Nanolab.

The software can be found on "CleanroomDrive\_Equipment\XRD\Rigaku software\RILauncher", it should be possible to install the software without a dongle. To use the software you have to log in. The user is: Administrator. There is no password.

Equipment performance and process related parameters

Equipment XRD SmartLab
Purpose Crystal structure analysis and thin film thickness measurement
  • Phase ID
  • Crystal Size
  • Crystallinity
  • Quality and degree of orientation
  • 3D orientation
  • Latice strain
  • Composition
  • Twist
  • 3D lattice constant
  • Thickness
  • Roughness
  • Density
X-ray generator

Maximum rated output

3 kW

Rated tube voltage

20 to 45 kV

Rated tube current

2 to 60 mA

Type

Sealed tube

Target

Cu

Focus size

0.4 mm x 8 mm (Line/Point)

Goniometer

Scanning mode

incident / receiver coupled or independent

Goniomenter radius

300 mm

Minimum step size

0.0001° (0.36")

Sample stage

  • χ:-5~+95°
  • φ:0~360°
  • Z:-4~+1 mm
  • X,Y:±50 mm for a 100 mm wafer
  • Rx,Ry:-5~+5°

Sample size

Diameter: 150 mm Thickness: 0~21 mm

Optics Incident side
  • Cross Beam Optics(CBO)
  • Ge(220)x2 monochromator
  • In-Plane Parallel Slit Collimator (PSC)
  • Soller slit
  • Variable divergence slit
Receiver side
  • Automatic variable scattering slit
  • Automatic variable receiver slit
  • Parallel slit analysers (PSA)
  • Ge(220)x2 analyser
Substrates Substrate size

up to 150 mm wafers

Allowed materials

All materials


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