Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions
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==Stress analysis== | ==Stress analysis - section under construction [[Image:section under construction.jpg|70px]]== | ||
Sputter deposition causes stress in the deposited thin film. Depending on the sputter parameters, the stress can be either tensile or compressive. Radu has investigated the stress in films deposited with the Lesker under a range of circumstances. | Sputter deposition causes stress in the deposited thin film. Depending on the sputter parameters, the stress can be either tensile or compressive. Radu has investigated the stress in films deposited with the Lesker under a range of circumstances. | ||