Specific Process Knowledge/Thin film deposition/Temescal: Difference between revisions

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 ==Quality control (QC) for the Temescal==
+{| border="1" cellspacing="2" cellpadding="2" colspan="3"
+|bgcolor="#98FB98" |'''Quality control (QC) for the Temescal'''
+|-
+|
 *[http://labmanager.dtu.dk/d4Show.php?id=5862&mach=429 QC procedure for the Temescal]<br>
 *[https://labmanager.dtu.dk/view_binary.php?type=data&mach=429 The newest QC data for the Temescal]<br>
+{| {{table}}
+| align="center" |
+{| border="1" cellspacing="1" cellpadding="2"  align="center" style="width:400px"
+! QC Recipe:
+! Ti / Au
+! other metal (if present, Al)
+|-
+|Deposition rate
+|10 Å/s
+|10 Å/s
+|-
+|Thickness
+|10 nm / 90 nm
+|100 nm
+|-
+|Pressure
+|Below 1*10<sup>-6</sup> mbar
+|Below 1*10<sup>-6</sup> mbar
+|-
+|}
+| align="center" valign="top"|
+{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:440px"
+!QC limits
+!Temescal
+|-
+|Measured average thickness
+|90-100 nm
+|-
+|Thickness deviation across a 4" wafer
+|+/- 5 %
+|-
+|Deposition rate deviation
+|+/- 20 %
+|-
+|}
+|-
+|}
+Thicknesses are measured in 5 points with one of the Dektak instruments.
+|}