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Specific Process Knowledge/Lithography/UVLithography: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,794 edits
Line 69: Line 69:
|Positive but the image can be reversed
|Positive but the image can be reversed
|310 - 420 nm
|310 - 420 nm
|[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials]
|[https://www.merckgroup.com/en/brands/pm/az-products.html Merck KGaA]
 
Supplied by [https://www.microchemicals.com/ MicroChemicals GmbH]
|Can be used for both positive and reverse processes with resist thickness between 1 and 4 µm.
|Can be used for both positive and reverse processes with resist thickness between 1 and 4 µm.
|[[media:AZ5214E.pdf‎|AZ5214E.pdf‎]]
|[[media:AZ5214E.pdf‎|AZ5214E.pdf‎]]
Line 100: Line 102:
|Positive
|Positive
|310 - 440 nm
|310 - 440 nm
|[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials]
|[https://www.merckgroup.com/en/brands/pm/az-products.html Merck KGaA]
 
Supplied by [https://www.microchemicals.com/ MicroChemicals GmbH]
|For process with resist thickness between 6 and 25 µm.  
|For process with resist thickness between 6 and 25 µm.  
|[[media:AZ4500.pdf‎|AZ4500.pdf‎]]
|[[media:AZ4500.pdf‎|AZ4500.pdf‎]]
Line 126: Line 130:
|Positive
|Positive
|310 - 445 nm
|310 - 445 nm
|[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials]
|[https://www.merckgroup.com/en/brands/pm/az-products.html Merck KGaA]
 
Supplied by [https://www.microchemicals.com/ MicroChemicals GmbH]
|High selectivity for dry etch.
|High selectivity for dry etch.


Line 153: Line 159:
|Negative
|Negative
|310 - 380 nm
|310 - 380 nm
|[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials]
|[https://www.merckgroup.com/en/brands/pm/az-products.html Merck KGaA]
 
Supplied by [https://www.microchemicals.com/ MicroChemicals GmbH]
|Negative sidewalls for lift-off.
|Negative sidewalls for lift-off.


Line 178: Line 186:
|Negative
|Negative
|350 - 400 nm
|350 - 400 nm
|[http://microchem.com/Prod-SU82000.htm Microchem]
|[https://kayakuam.com/products/su-8-2000/ Kayaku Advanced Materials, Inc.]
 
Supplied by [http://www.microresist.com/products/ micro resist technology GmbH]
|High aspect ratio.
|High aspect ratio.


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