Specific Process Knowledge/Lithography/Baking

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Comparing baking methods

	Hotplate: 90-110C	Hotplate 1, 2, 3 and 4 (SU8)	Small benchtop hotplates	Gamma hotplates	Oven 90C	Oven: 110C - 250C	Oven 250C
Purpose	Programmable, contact bake Soft bake PEB	Programmable, ramped contact bake Soft bake of SU-8 PEB of SU-8	Adjustable temperature, contact bake Soft bake PEB Hard bake	Recipe dependent temperature, contact or proximity bake Soft bake PEB Hard bake	Manual convection bake Soft bake	Manual convection bake Hard bake Post-exposure bake	Manual convection bake Dehydration NO resist!
Temperature	Maximum 120°C	Maximum 110°C	Maximum temperature is hotplate dependent	Fixed at various recipe dependent temperatures.	Fixed at 90°C	110 - 250°C Return to 110°C after use	Fixed at 250°C
Substrate size	50 mm wafer 100 mm wafer 150 mm wafer	pieces 50 mm wafers 100 mm wafers 150 mm wafer 200 mm wafer	pieces 50 mm wafers 100 mm wafers 150 mm wafer 200 mm wafer	100 mm wafers 150 mm wafers	100 mm wafers 150 mm wafers	100 mm wafers 150 mm wafers	100 mm wafers 150 mm wafers
Allowed materials	All substrates Film or pattern of all types	Silicon, glass, and polymer substrates Film or pattern of all types except type IV	Hotplate dependent. (All substrates and film or pattern of all types, unless otherwise noted on the hotplate)	Silicon and glass substrates	Silicon, glass, and polymer substrates Film or pattern of all types	Silicon, glass, and high Tg polymer substrates Film or pattern of all types	Silicon, glass, and high Tg polymer substrates Film or pattern of all types except resist|
Restrictions (Not allowed)		III-V, copper, steel substrates Pb, Te films	Hotplate dependent. Any restrictions will be noted on the hotplate.		III-V, copper, steel substrates	III-V, low Tg polymer, copper, steel substrates	III-V, low Tg polymer, copper, steel substrates Resist is not allowed
QC	Open lid @ 110°C: Mean: 109.16°C Uniformity error: 1.12%. closed lid @ 110°C: Mean: 109.54°C Uniformity error: 0.89%.	Hotplate 1 @ 100°C: Mean: 96.53°C Uniformity error: 3.34%. Hotplate 2 @ 100°C: Mean: 99.84°C Uniformity error: 3.05%. Hotplate 3 @ 100°C: Mean: 97.07°C Uniformity error: 4.60%. Hotplate 4 @ 100°C: Mean: 98.28°C Uniformity error: 3.92%. Hotplate 1: https://labmanager.dtu.dk/view_binary.php?type=data&mach=122		Spincoater: Gamma UV: TM16 @ 110°C: Mean: 110.1°C Uniformity error: 0.23%. TM15 @ 100°C: Mean: 99.5°C Uniformity error: 0.95%. TM14 @ 90°C: Mean: 88.9°C Uniformity error: 1.01%. TM13 @ 110°C: Mean: 108.6°C Uniformity error: 1.45%. Developer: TMAH UV-lithography: Coming soon. Spincoater: Süss stepper: TM16 @ 175°C: Mean: 174.4°C Uniformity error: 0.72%. TM15 @ 175C: Mean: 174.9°C Uniformity error: 0.15%. TM14 @ 130°C: Mean: 129.8°C Uniformity error: 0.23%. TM13 @ 130°C: Mean: 129.7°C Uniformity error: 0.20%. TM12 @ 23°C: Mean: 22.9°C Uniformity error: 0.46%. TM11 @ 23°C: Mean: 22.8°C Uniformity error: 0.46%. Developer: Stepper: TM14 @ 130°C: Mean: 129.9°C Uniformity error: 0.62%. TM13 @ 130°C: Mean: 130.1°C Uniformity error: 0.73%. TM11 @ 20°C: Mean: 20.2°C Uniformity error: 0.10%.

Hotplates

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Hotplate: 90-110C

Hotplate: 90-110C located in C-1

Hotplate: 90-110C is used for baking of 2" - 6" wafers. Do not exceed 120°C.

The user manual, and contact information can be found in LabManager: Hotplate: 90-110C

Hotplate 1 (SU8), Hotplate 2 (SU8), Hoplate 3(SU8) and Hotplate 4(SU8)

Hotplate 1 (SU8) and Hotplate 2 (SU8) situated in C-1

We have four dedicated SU-8 hotplates in C-1.

Users can control the ramp-time, the baking temperature, and the baking time. In order to avoid thermal curing of SU-8 residues on the hotplates, they are temperature limited to 110°C.

The user manual, and contact information can be found in LabManager: Hotplate 1 (SU8) Hotplate 2 (SU8) Hotplate 3 (SU8) Hotplate 4 (SU8)

Small benchtop hotplates

Model: Präzitherm PZ 28-2.

Contact bake only. Maximum temperature is hotplate dependent.

• 
  Benchtop hotplate located in A-5
• 
  Benchtop hotplates located in A-5
• 
  Benchtop hotplate located in C-1
• 
  Benchtop hotplate located in E-5

Gamma hotplates

Hotplate modules in Gamma UV spincoater.

Hotplate temperatures are recipe dependent.

Information about the Süss MicroTec Gamma tools can be found in labadviser:

• Spin Coater: Süss Stepper
• Developer: TMAH Stepper
• Developer TMAH UV-lithography
• Spin Coater: Gamma UV
• Spin Coater: Gamma e-beam & UV

Ovens

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Oven 90C

Oven 90C situated in C-1

The oven is mostly used for baking of several wafers at a time at 90 °C as a soft baking step after a spin coating of photoresist. For 1.5µm resist the baking time is 30 min. For most of the other resist thicknesses it is also 30 min.

The user manual, and contact information can be found in LabManager: Oven 90C

Oven: 110C - 250C

Oven: 110C - 250C situated in C-1

Variable temperature convection oven mostly used for baking of wafers as a hard baking step after development of photoresist.

The set-point can be varied, but should always be returned to 110°C after use.

The user manual, and contact information can be found in LabManager: Oven: 110C - 250C

Oven 250C for pretreatment

Oven 250C for pretreatment situated in C-1

See Oven 250C