Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope: Difference between revisions
| Line 120: | Line 120: | ||
* The oscillations in pressure now last the entire dep cycle - it never stabilizes. | * The oscillations in pressure now last the entire dep cycle - it never stabilizes. | ||
* Optimizing a recipe to arrive at a minimum reflected power, for both coil and platen, using the Pro software datalogging may be somewhat illusory as it only picks a fraction of the spikes occurring at every change of plasma conditions. | * Optimizing a recipe to arrive at a minimum reflected power, for both coil and platen, using the Pro software datalogging may be somewhat illusory as it only picks a fraction of the spikes occurring at every change of plasma conditions. | ||
What to do about this? | |||
=== How to improve this === | |||
Minimizing the reflected power is essential to ensure that the instrument hardware doesn't degrade over time and that the users have accurate information about the processes. Realizing that there may be a challenge with detecting reflected powers we need to decide what to do. We can abandon all processes and start developing new ones - this will halt all processing. Instead, a set of new recipes will be developed. | |||
==== Stabilizing the pressure ==== | |||