Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace: Difference between revisions

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 [[Image:A3helstak.jpg|thumb|300x300px|Phosphorus Drive-in furnace (A3). Positioned in cleanroom B-1]]
-The Phosphorus Drive-in furnace (A3) is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide layer and for drive-in of phosphorus after a pre-deposition. Phosphorus pre-deposition takes place in the Phosphorus Pre-dep furnace (A4). The Phosphorus Drive-in furnace can also be used for drive-in of phosphorus which has been ion implanted.
+The Phosphorus Drive-in furnace (A3) is a Tempress horizontal furnace for thermal oxidation of silicon wafers. Furthermore, the furnace is used for phosphorus drive-in after the pre-deposition or after boron ion implantation.
-The oxidation recipes on the  furnace are named e.g. "WET1000" and "DRY1000", where "WET" or "DRY" indicates whether it is a wet or dry oxidation process, and the number indicates the oxidation temperature.
+The furnace is mostly used for wet and dry thermal oxidation of silicon wafers. The oxidation recipes are named e.g. "WET1000" and "DRY1000", where "WET" or "DRY" indicates whether it is a wet or dry oxidation process, and the number indicates the oxidation temperature.
-The Phosphorus Drive-in furnace is the third furnace tube in the A-stack positioned in cleanroom B-1. The furnaces in the A-stack are the cleanest of all furnaces in the cleanroom. Please be aware of that all wafers have to be RCA cleaned before they enter the furnace, and check the cross contamination information in LabManager before you use the furnace.
+The purpose of the phosphorus doping is to make conductive structures, etch stop layers etc. After a phosphorus pre-deposition/doping or ion implantation process, a drive-in process with or without an oxide growth is done in the furnace. The phosphorus pre-deposition is normally done in the Phosphorus Pre-dep (A4) furnace, and ion implantation have to be done elsewhere.
+The Phosphorus Drive-in furnace is the third furnace tube in the A-stack positioned in cleanroom B-1. The furnaces in the A-stack are the cleanest of all furnaces in the cleanroom. Please be aware of that all wafers have to be RCA cleaned , before they enter the furnace, and check the cross contamination information in LabManager, before you use the furnace.
+The Boron Drive-in and Pre-dep furnace is the top furnace tube in the furnace A-stack positioned in cleanroom B-1. The furnaces in the A-stack are the cleanest of all furnaces in the cleanroom. Please be aware of that all wafers have to be RCA cleaned before they enter the furnace (except wafers coming form the Phosphorus Pre-dep furnace that have been BHF etched in the dedicated bath at the RCA bench), and please check the cross contamination information in LabManager, before you use the furnace. Before boron pre-deposition, also the source wafers and a dedicated carbide boat have to be RCA cleaned.