Specific Process Knowledge/Etch/DRIE-Pegasus/processD: Difference between revisions
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{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | |||
|+ '''Process D4 recipe''' | |||
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! width="120" | Main etch (D->E) | |||
! width="120" | Etch | |||
! width="120" | Dep | |||
|- | |||
! Gas flow (sccm) | |||
| SF<sub>6</sub> 275 O<sub>2</sub> 5 | |||
| C<sub>4</sub>F<sub>8</sub> 150 | |||
|- | |||
! Cycle time (secs) | |||
| 1 | |||
| 2.2 | |||
|- | |||
! Pressure (mtorr) | |||
| 26 | |||
| 20 | |||
|- | |||
! Coil power (W) | |||
| 2500 | |||
| 2000 | |||
|- | |||
! Platen power (W) | |||
| 35 | |||
| 0 | |||
|- | |||
! Cycles | |||
| colspan="2" | 110 (process time 08:04) | |||
|- | |||
! Common | |||
| colspan="2" | Temperature 0 degs, HBC 10 torr, Long funnel, with baffle & 100 mm spacers | |||
|} | |} | ||